Process Monitoring Application

Process Step : Wafer Cleaning and Texturing
The sample use case below shows how the tool can be used to optimize an etch process during Solar wafer manufacturing by monitoring roughness at various etch intervals.  The ability of the Zeta-20 to handle very low reflectivity and very high roughness surfaces is an enabler for such applications.  Small variations in etch depth and roughness can be detected by using the Zeta 3D software to analyze the images and compare them side by side.  This enables the wafer manufacturer to optimize the roughness that maximizes the light trapped by the solar cell.